Refractive index structures in polymers

Patricia J. Scully; Alexandra Baum; Dun Liu; Walter Perrie

doi:10.1007/978-3-642-23366-1_12

Refractive index structures in polymers

Patricia J. Scully
, Alexandra Baum
, Dun Liu
, Walter Perrie

University of Manchester
University of Liverpool

Research output: Chapter in Book or Conference Publication/Proceeding › Chapter › peer-review

5 Citations (Scopus)

Abstract

Refractive index structuring of poly(methyl methacrylate) (PMMA) by femtosecond (fs) laser irradiation is discussed, including writing conditions defined by wavelength, pulse duration, and associated photochemistry. The aim is to determine optimal conditions for refractive index modification, Δn without doping for photosensitivity. The work presented here forms a generic methodology for other polymers. Nanostructuring using holographic optics and precise control of beam parameters has versatile application for three-dimensional (3D) photonic devices. Self-focusing and filamentation at various depths below the surface of bulk PMMA are discussed together with parallel processing using a spatial light modulator. Applications of refractive index structures in polymers include microfluidics, lab-on-a-chip, organic optoelectronic devices, and gratings in polymer optical fibres.

Original language	English
Title of host publication	Femtosecond Laser Micromachining
Subtitle of host publication	Photonic and Microfluidic Devices in Transpaent Materials
Editors	Roberto Osellame, Giulio Cerullo, Roberta Ramponi
Pages	315-347
Number of pages	33
DOIs	https://doi.org/10.1007/978-3-642-23366-1_12
Publication status	Published - 2012
Externally published	Yes

Publication series

Name	Topics in Applied Physics
Volume	123
ISSN (Print)	0303-4216
ISSN (Electronic)	1437-0859

Access to Document

10.1007/978-3-642-23366-1_12

Cite this

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title = "Refractive index structures in polymers",

abstract = "Refractive index structuring of poly(methyl methacrylate) (PMMA) by femtosecond (fs) laser irradiation is discussed, including writing conditions defined by wavelength, pulse duration, and associated photochemistry. The aim is to determine optimal conditions for refractive index modification, Δn without doping for photosensitivity. The work presented here forms a generic methodology for other polymers. Nanostructuring using holographic optics and precise control of beam parameters has versatile application for three-dimensional (3D) photonic devices. Self-focusing and filamentation at various depths below the surface of bulk PMMA are discussed together with parallel processing using a spatial light modulator. Applications of refractive index structures in polymers include microfluidics, lab-on-a-chip, organic optoelectronic devices, and gratings in polymer optical fibres.",

author = "Scully, \{Patricia J.\} and Alexandra Baum and Dun Liu and Walter Perrie",

year = "2012",

doi = "10.1007/978-3-642-23366-1\_12",

language = "English",

isbn = "9783642233654",

series = "Topics in Applied Physics",

pages = "315--347",

editor = "Roberto Osellame and Giulio Cerullo and Roberta Ramponi",

booktitle = "Femtosecond Laser Micromachining",

}

Refractive index structures in polymers. / Scully, Patricia J.; Baum, Alexandra; Liu, Dun et al.
Femtosecond Laser Micromachining: Photonic and Microfluidic Devices in Transpaent Materials. ed. / Roberto Osellame; Giulio Cerullo; Roberta Ramponi. 2012. p. 315-347 (Topics in Applied Physics; Vol. 123).

Research output: Chapter in Book or Conference Publication/Proceeding › Chapter › peer-review

TY - CHAP

T1 - Refractive index structures in polymers

AU - Scully, Patricia J.

AU - Baum, Alexandra

AU - Liu, Dun

AU - Perrie, Walter

PY - 2012

Y1 - 2012

N2 - Refractive index structuring of poly(methyl methacrylate) (PMMA) by femtosecond (fs) laser irradiation is discussed, including writing conditions defined by wavelength, pulse duration, and associated photochemistry. The aim is to determine optimal conditions for refractive index modification, Δn without doping for photosensitivity. The work presented here forms a generic methodology for other polymers. Nanostructuring using holographic optics and precise control of beam parameters has versatile application for three-dimensional (3D) photonic devices. Self-focusing and filamentation at various depths below the surface of bulk PMMA are discussed together with parallel processing using a spatial light modulator. Applications of refractive index structures in polymers include microfluidics, lab-on-a-chip, organic optoelectronic devices, and gratings in polymer optical fibres.

AB - Refractive index structuring of poly(methyl methacrylate) (PMMA) by femtosecond (fs) laser irradiation is discussed, including writing conditions defined by wavelength, pulse duration, and associated photochemistry. The aim is to determine optimal conditions for refractive index modification, Δn without doping for photosensitivity. The work presented here forms a generic methodology for other polymers. Nanostructuring using holographic optics and precise control of beam parameters has versatile application for three-dimensional (3D) photonic devices. Self-focusing and filamentation at various depths below the surface of bulk PMMA are discussed together with parallel processing using a spatial light modulator. Applications of refractive index structures in polymers include microfluidics, lab-on-a-chip, organic optoelectronic devices, and gratings in polymer optical fibres.

UR - https://www.scopus.com/pages/publications/84883192948

U2 - 10.1007/978-3-642-23366-1_12

DO - 10.1007/978-3-642-23366-1_12

M3 - Chapter

AN - SCOPUS:84883192948

SN - 9783642233654

T3 - Topics in Applied Physics

SP - 315

EP - 347

BT - Femtosecond Laser Micromachining

A2 - Osellame, Roberto

A2 - Cerullo, Giulio

A2 - Ramponi, Roberta

ER -

Refractive index structures in polymers

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