Linnik microscope imaging of integrated circuit structures

D. M. Gale; M. I. Pether; J. C. Dainty

doi:10.1364/AO.35.000131

Linnik microscope imaging of integrated circuit structures

D. M. Gale
, M. I. Pether
, J. C. Dainty

Research output: Contribution to a Journal (Peer & Non Peer) › Article › peer-review

62 Citations (Scopus)

Abstract

Experimental one-dimensional intensity and phase images of thick (>200 nm) oxide lines on silicon are presented together with profiles predicted from the waveguide model. Experimental results were obtained with a purpose-built Linnik interference microscope that makes use of phase-shifting interferometry for interferogram analysis. Profiles have been obtained for both TE and TM polarizations for a wide range of focal positions and in both bright-field [type 1(a)] scanning and confocal modes of microscope operation. The results show extremely good agreement despite several simplifying assumptions incorporated into the theoretical model to reduce computing times.

Original language	English
Pages (from-to)	131-148
Number of pages	18
Journal	Applied Optics
Volume	35
Issue number	1
DOIs	https://doi.org/10.1364/AO.35.000131
Publication status	Published - 1 Jan 1996
Externally published	Yes

Keywords

Integrated circuit metrology
Interference microscopy
Profilometry
Waveguide imaging theory

Access to Document

10.1364/AO.35.000131

Cite this

@article{c980e22c012c412e893251cf905d32ae,

title = "Linnik microscope imaging of integrated circuit structures",

abstract = "Experimental one-dimensional intensity and phase images of thick (>200 nm) oxide lines on silicon are presented together with profiles predicted from the waveguide model. Experimental results were obtained with a purpose-built Linnik interference microscope that makes use of phase-shifting interferometry for interferogram analysis. Profiles have been obtained for both TE and TM polarizations for a wide range of focal positions and in both bright-field [type 1(a)] scanning and confocal modes of microscope operation. The results show extremely good agreement despite several simplifying assumptions incorporated into the theoretical model to reduce computing times.",

keywords = "Integrated circuit metrology, Interference microscopy, Profilometry, Waveguide imaging theory",

author = "Gale, \{D. M.\} and Pether, \{M. I.\} and Dainty, \{J. C.\}",

year = "1996",

month = jan,

day = "1",

doi = "10.1364/AO.35.000131",

language = "English",

volume = "35",

pages = "131--148",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "Optica Publishing Group",

number = "1",

}

TY - JOUR

T1 - Linnik microscope imaging of integrated circuit structures

AU - Gale, D. M.

AU - Pether, M. I.

AU - Dainty, J. C.

PY - 1996/1/1

Y1 - 1996/1/1

N2 - Experimental one-dimensional intensity and phase images of thick (>200 nm) oxide lines on silicon are presented together with profiles predicted from the waveguide model. Experimental results were obtained with a purpose-built Linnik interference microscope that makes use of phase-shifting interferometry for interferogram analysis. Profiles have been obtained for both TE and TM polarizations for a wide range of focal positions and in both bright-field [type 1(a)] scanning and confocal modes of microscope operation. The results show extremely good agreement despite several simplifying assumptions incorporated into the theoretical model to reduce computing times.

AB - Experimental one-dimensional intensity and phase images of thick (>200 nm) oxide lines on silicon are presented together with profiles predicted from the waveguide model. Experimental results were obtained with a purpose-built Linnik interference microscope that makes use of phase-shifting interferometry for interferogram analysis. Profiles have been obtained for both TE and TM polarizations for a wide range of focal positions and in both bright-field [type 1(a)] scanning and confocal modes of microscope operation. The results show extremely good agreement despite several simplifying assumptions incorporated into the theoretical model to reduce computing times.

KW - Integrated circuit metrology

KW - Interference microscopy

KW - Profilometry

KW - Waveguide imaging theory

UR - https://www.scopus.com/pages/publications/0001606237

U2 - 10.1364/AO.35.000131

DO - 10.1364/AO.35.000131

M3 - Article

SN - 1559-128X

VL - 35

SP - 131

EP - 148

JO - Applied Optics

JF - Applied Optics

IS - 1

ER -

Linnik microscope imaging of integrated circuit structures

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this