An asymptotic analysis of the kick-out diffusion mechanism

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Abstract

The kick-out model for impurity diffusion in semiconductors is studied. The kick-out mechanism is thought to play an important rôle in a number of applications, including the diffusion of zinc and chromium in gallium arsenide. Asymptotic solutions are derived for both one- and two-dimensional surface source problems. In the one-dimensional case, a mechanism for the destruction of self-interstitials is also incorporated. The calculated diffusion profiles have shapes which are typical of diffusion systems in which the kick-out mechanism is believed to be active. For the two-dimensional problem, contours of constant impurity concentration are calculated and some are found to have the 'bird's beak' shape which is frequently observed in experiments.

Original languageEnglish (Ireland)
Pages (from-to)546-565
Number of pages19
JournalZ. Angew. Math. Phys.
Volume46
Issue number4
DOIs
Publication statusPublished - 1 Jan 1995

Authors (Note for portal: view the doc link for the full list of authors)

  • Authors
  • Meere, M. G. and King, J. R.

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